The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Jun. 21, 2024
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Giampietro Bieli, Santa Clara, CA (US);

Andy Wijaya, Milpitas, CA (US);

Mor Azaria, Migdal Ha'emek, IL;

Tsahi Muyal, Milpitas, CA (US);

Izhar Agam, Milpitas, CA (US);

Adi Pahima, Migdal Ha'emek, IL;

Yoram Uziel, Yodfat, IL;

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01F 1/86 (2006.01);
U.S. Cl.
CPC ...
H01L 22/30 (2013.01); G01F 1/86 (2013.01);
Abstract

A system and method for measuring substrate processing conditions are disclosed. The system may include an instrumented substrate including a substrate body. The instrumented substrate may include one or more sensors configured to measure one or more conditions of the at least one of the substrate body or of an external environment proximate to a surface of the substrate body. The substrate body may include channels within the substrate body connected to the one or more sensors. Each channel may include an open channel configured to allow a flow of gas through the open channel.


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