Migdal Haemek, Israel

Adi Pahima


Average Co-Inventor Count = 3.7

ph-index = 1


Location History:

  • Migdal-Hahemek, IL (2023)
  • Migdal Ha'emek, IL (2023 - 2024)

Company Filing History:


Years Active: 2023-2025

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5 patents (USPTO):Explore Patents

Title: Adi Pahima: Innovator in Substrate Cleaning Technologies

Introduction

Adi Pahima is a notable inventor based in Migdal Haemek, Israel. He has made significant contributions to the field of substrate cleaning technologies, holding a total of 5 patents. His work focuses on innovative cleaning systems that enhance the efficiency and effectiveness of substrate maintenance.

Latest Patents

Among his latest patents, Pahima has developed an in-situ process chamber chuck cleaning system. This cleaning assembly includes a substrate with one or more patterns formed on its bottom side. These patterns are designed to attract particles from a chuck through electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck. Another significant patent is the electrostatic substrate cleaning system and method. This system features a chamber and a substrate stage that secures the substrate for cleaning with a specialized cleaning head. The cleaning head utilizes a disposable electrode ribbon that electrostatically removes particles from the substrate, ensuring a thorough cleaning process.

Career Highlights

Adi Pahima is currently employed at Kla Corporation, where he continues to innovate in the field of substrate cleaning technologies. His work has been instrumental in advancing the capabilities of cleaning systems used in various applications.

Collaborations

Pahima collaborates with talented coworkers, including Shai Mark and Mor Azaria, who contribute to the development of cutting-edge technologies in their field.

Conclusion

Adi Pahima's contributions to substrate cleaning technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions for improved substrate maintenance.

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