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San Jose, CA, United States of America

Kla Instruments Corporation

USPTO Granted Patents = 46

Forward Citations = 4,726

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103 inventors (with patents filed for the assignee):

Curt H Chadwick (10 out of 17 patents)

Mark Joseph Wihl (8 out of 18 patents)

Bin-Ming Benjamin Tsai (5 out of 49 patents)

4. Alan D Brodie (4 out of 34 patents)

5. Michael E Fein (4 out of 79 patents)

6. Anil A Desai (4 out of 5 patents)

7. Paul Sandland (4 out of 5 patents)

8. Yung-Ho Alex Chuang (3 out of 159 patents)

9. Richard R Simmons (3 out of 9 patents)

10. Tao-Yi Fu (3 out of 29 patents)

11. Marek Zywno (3 out of 17 patents)

12. Dan Meisburger (3 out of 5 patents)

13. Damon Floyd Kvamme (3 out of 30 patents)

14. David R Shafer (3 out of 86 patents)

15. Jack Y Jau (3 out of 3 patents)

Core Competencies:

Image Sampling

Ultraviolet Inspection

Overlay Alignment

Electron Beam Microscopy

Automated Inspection

Optical Inspection

Defect Detection

Catadioptric Imaging

Wafer Inspection

Microscope Enhancement

Photomask Inspection

Three-Dimensional Analysis

46 patents: Sort by Forward Citations

1. 6141038 - Alignment correction prior to image sampling in inspection systems (2000-10-31),

2. 6133576 - Broad spectrum ultraviolet inspection methods employing catadioptric (2000-10-17),

3. 6079256 - Overlay alignment measurement of wafers (2000-06-27),

4. 6078386 - Inspection system simultaneously utilizing monochromatic darkfield and (2000-06-20),

5. 6021214 - Inspection method and apparatus for the inspection of either random or (2000-02-01),

6. 5991699 - Detecting groups of defects in semiconductor feature space (1999-11-23),

7. 5956174 - Broad spectrum ultraviolet catadioptric imaging system (1999-09-21),

8. 5889593 - Optical system and method for angle-dependent reflection or transmission (1999-03-30),

9. 5822055 - Optical inspection of a specimen using multi-channel responses from the (1998-10-13),

10. 5737072 - Automated photomask inspection apparatus and method (1998-04-07),

11. 5717518 - Broad spectrum ultraviolet catadioptric imaging system (1998-02-10),

12. 5717204 - Inspecting optical masks with electron beam microscopy (1998-02-10),

13. 5665968 - Inspecting optical masks with electron beam microscopy (1997-09-09),

14. 5640237 - Method and apparatus for detecting non-uniformities in reflective (1997-06-17),

15. 5578821 - Electron beam inspection system and method (1996-11-26),

KLA Instruments Corporation is a leading provider of advanced measurement and inspection solutions for the semiconductor and electronics industries. With a focus on precision and efficiency, their cutting-edge instruments help manufacturers ensure the quality and reliability of their products. KLA Instruments Corporation offers a wide range of innovative tools, including metrology systems, defect inspection systems, and process control software. Through their industry-leading technology and expertise, they enable their customers to optimize processes, increase yields, and reduce manufacturing costs.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

46 Patents

#185 in San Jose, CA

#1,742 in California

#7,326 in US

#14,671 in the World

San Jose, CA, United States of America

Kla Instruments Corporation

Forward Citations = 4,726

103 inventors:

Curt H Chadwick (10 out of 17 patents)

Mark Joseph Wihl (8 out of 18 patents)

Bin-Ming Benjamin Tsai (5 out of 49 patents)

4. Alan D Brodie (4 out of 34 patents)

5. Michael E Fein (4 out of 79 patents)

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