San Jose, CA, United States of America

Marek Zywno

This inventor holds 17 USPTO granted patents and 1 published patent application, primarily in Wafer Processing Technology. Top assignees: Kla Tencor Corporation, Kla Instruments Corporation, Kla-Tencor Technologies Corporation. Active years: 1996-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marek Zywno. Retrieved from https://idiyas.com/inventor/marek-zywno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 76.5

Average Co-Inventor Count = 2.0

ph-index = 6

Forward Citations = 739(Granted Patents)


Company Filing History:


Years Active: 1996-2016

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Areas of Expertise:
Wafer Stage
Reciprocating Actuation
Stage Mirror
Substrate Processing
Electron Beam Projection
Fluid Bearings
Vacuum Chucks
Automated Inspection
17 patents (USPTO):Explore Patents

Title: The Innovative Journey of Marek Zywno

Introduction: Marek Zywno, a talented inventor based in San Jose, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Marek Zywno holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a background in computer science and engineering, Marek Zywno has worked for top tech companies in Silicon Valley, where he honed his skills and developed revolutionary ideas that have shaped the industry.

Collaborations: Throughout his career, Marek Zywno has collaborated with leading researchers and engineers to bring his inventions to life, fostering a culture of innovation and creativity in the tech community.

Conclusion: Marek Zywno's passion for pushing the boundaries of technology and his relentless pursuit of excellence make him a true pioneer in the world of inventions. His impact on the industry is profound, and his legacy will continue to inspire future generations of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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