Mark Joseph Wihl

Title: The Innovative Mind of Mark Joseph Wihl

Introduction: Mark Joseph Wihl, an accomplished inventor based in Tracy, California, has made significant contributions to the world of photolithography through his innovative patents. With a total of 18 patents to his name, Wihl's work addresses critical aspects of photomask defectivity, enhancing the quality and efficiency of semiconductor manufacturing processes.

Latest Patents: Among his latest innovations, Wihl has developed methods for monitoring changes in photomask defectivity. His patented technology involves inspecting a reticle that meets specifications to generate baseline candidate defects, including their location and size. After utilizing the reticle in photolithography, it undergoes further inspection to reveal current candidate defects and their respective locations and sizes. The resulting inspection report provides a filtered summary, distinguishing between candidate defects that either match or fail to match the baseline's characteristics. This precise inspection methodology ensures that any unusual features in the reticle are accurately documented and addressed.

Wihl's additional patent in this area focuses on monitoring unusual events related to reticle features. By establishing a baseline event for each atypical feature, he is able to produce current events that detail the conditions of the reticle after use. This process ensures that critical information about defects is maintained, effectively enhancing the performance and reliability of photolithographic processes.

Career Highlights: Throughout his career, Mark Joseph Wihl has been associated with notable companies in the semiconductor industry, including Kla Instruments Corporation and KLA-Tencor Corporation. His roles in these organizations enabled him to advance his research and development capabilities, while also contributing to significant progress within the industry.

Collaborations: Wihl has collaborated with prominent colleagues such as Damon Floyd Kvamme and Michael E. Fein. Their collective expertise in various aspects of photolithography and semiconductor technology has fostered an environment ripe for innovation and efficiency in defect monitoring and management.

Conclusion: Mark Joseph Wihl stands out as a key inventor within the semiconductor industry, driven by his passion for innovation and quality enhancement. His array of patents reflects a commitment to excellence in photomask defectivity monitoring, positioning him as a vital contributor to advancements in semiconductor manufacturing technology. As Wihl continues to push the boundaries of his field, his legacy as an inventor will undoubtedly inspire future generations.