The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2010

Filed:

May. 06, 2008
Applicants:

David Alles, Los Altos, CA (US);

Mark Wihl, Tracy, CA (US);

Stan Stokowski, Danville, CA (US);

Yalin Xiong, Union City, CA (US);

Damon Kvamme, Los Gatos, CA (US);

Inventors:

David Alles, Los Altos, CA (US);

Mark Wihl, Tracy, CA (US);

Stan Stokowski, Danville, CA (US);

Yalin Xiong, Union City, CA (US);

Damon Kvamme, Los Gatos, CA (US);

Assignee:

KLA-Tencor Corp., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.


Find Patent Forward Citations

Loading…