Company Filing History:

17 out of 1,787

Kla Tencor Corporation

patents

4 out of 641

Kla-tencor Technologies Corporation

patents

Years Active: 2007-2022

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21 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11270430 - Wafer inspection using difference images (2022-03-08),

2. 10539512 - Block-to-block reticle inspection (2020-01-21),

3. 10451563 - Inspection of photomasks by comparing two photomasks (2019-10-22),

4. 9892503 - Monitoring changes in photomask defectivity (2018-02-13),

5. 9778207 - Integrated multi-pass inspection (2017-10-03),

6. 9778205 - Delta die and delta database inspection (2017-10-03),

7. 9766185 - Block-to-block reticle inspection (2017-09-19),

8. 9518935 - Monitoring changes in photomask defectivity (2016-12-13),

9. 8785082 - Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality (2014-07-22),

10. 8611637 - Wafer plane detection of lithographically significant contamination photomask defects (2013-12-17),

11. 8204297 - Methods and systems for classifying defects detected on a reticle (2012-06-19),

12. 8151220 - Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data (2012-04-03),

13. 8090189 - Detection of thin line for selective sensitivity during reticle inspection (2012-01-03),

14. 7995832 - Photomask inspection and verification by lithography image reconstruction using imaging pupil filters (2011-08-09),

15. 7995199 - Method for detection of oversized sub-resolution assist features (2011-08-09),

Title: Yalin Xiong: A Pioneer in Wafers and Reticle Inspection

Introduction

Yalin Xiong, based in Union City, CA, is an accomplished inventor with a remarkable portfolio comprising 21 patents. His innovative contributions primarily focus on enhancing inspection techniques in the semiconductor industry, showcasing his profound impact on technology and quality assurance processes.

Latest Patents

Among his latest innovations, Yalin's patents include a system for wafer inspection using difference images. This system significantly improves the signal-to-noise ratio during optical inspections of wafers, leading to heightened sensitivity in detecting defects. The method involves computing a reference image that minimizes the norm of the difference between the test image and itself, establishing a more precise analysis framework. Another notable patent is for block-to-block reticle inspection. This method entails acquiring a swath image of a reticle, identifying occurrences of blocks within it, and determining their characteristics and spatial offsets to ensure greater accuracy and reliability in the inspection process.

Career Highlights

Throughout his career, Yalin Xiong has made significant contributions to notable companies, including KLA-Tencor Corporation and KLA-Tencor Technologies Corporation. His work in these organizations has allowed him to engage deeply with advanced technologies and methodologies, furthering his expertise in the realms of optical inspection.

Collaborations

Yalin has collaborated with esteemed professionals in his field, including Carl Hess and Mark Joseph Wihl. These collaborations have not only enriched his knowledge but also led to groundbreaking advancements in inspection technology.

Conclusion

Yalin Xiong's impressive portfolio of patents and his collaborations within the technology sector underscore his status as a leading figure in innovations related to wafer and reticle inspection. His work continues to inspire advancements in the semiconductor industry, reflecting his commitment to enhancing inspection processes and technological innovation.

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