The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2020

Filed:

Sep. 18, 2017
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Abdurrahman Sezginer, Monte Sereno, CA (US);

Patrick LoPresti, San Jose, CA (US);

Joe Blecher, San Jose, CA (US);

Rui-fang Shi, Cupertino, CA (US);

Yalin Xiong, Pleasanton, CA (US);

John Fielden, Los Altos, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01); G01N 21/88 (2006.01); G01N 21/958 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G01N 21/8851 (2013.01); G01N 21/8806 (2013.01); G01N 21/958 (2013.01); G06T 7/001 (2013.01); G01N 2021/8887 (2013.01); G01N 2201/125 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.


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