Rui-Fang Shi

Title: Innovations of Rui-Fang Shi in Photolithography and Extreme Ultraviolet Technology

Introduction

Rui-Fang Shi, based in Cupertino, CA, is a distinguished inventor with an impressive portfolio of 31 patents. His contributions significantly advance the fields of photolithography and extreme ultraviolet (EUV) technologies, reflecting a deep commitment to innovation and technological advancement.

Latest Patents

Among Rui-Fang Shi's notable patents, two stand out for their technological ingenuity. The first is a patent for a "Rotating target for extreme ultraviolet source with liquid metal." This invention encompasses a vacuum chamber with a rotating target assembly that features an annular groove, effectively utilizing centrifugal force to create a layer of molten metal. The distal wall of the groove incorporates a porous region, showcasing a novel approach to EUV light source design.

Another significant patent is titled "Inspection of reticles using machine learning." This invention involves methods and apparatus for inspecting photolithographic reticles. By simulating a variety of reference far-field images through a physics-based model, the system compares these images to test images obtained from the inspection system. This process aids in the effective identification of defects within the reticles, illustrating the application of machine learning in enhancing photolithographic processes.

Career Highlights

Throughout his career, Rui-Fang Shi has worked with renowned companies such as KLA-Tencor Corporation and KLA Corporation, where he has made substantial contributions to advancing semiconductor technology. His extensive experience in these organizations has helped refine and innovate the products tailored for the photolithography industry.

Collaborations

Rui-Fang Shi has collaborated with notable experts in his field, including Abdurrahman Sezginer and Haifeng Huang. These collaborations have fostered a rich exchange of knowledge, further driving progress in their joint endeavors within the realms of semiconductor manufacturing and innovation.

Conclusion

In summary, Rui-Fang Shi's innovative patents demonstrate his profound impact on the fields of extreme ultraviolet technology and photolithography. His work not only showcases his technical expertise but also his dedication to pushing the boundaries of what is possible in semiconductor technology. As industries continue to evolve, Rui-Fang's contributions will undoubtedly play a monumental role in shaping the future of these fields.