The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2022
Filed:
Oct. 05, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Rui-Fang Shi, Cupertino, CA (US);
Dmitry Skvortsov, San Jose, CA (US);
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01N 21/956 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8806 (2013.01); G01B 11/0608 (2013.01); G01N 21/956 (2013.01); G01N 2021/95676 (2013.01);
Abstract
Heights on a surface of a photomask are measured using broadband light interferometry. The heights include heights of patterned areas of the photomask. A focal map is produced from the measured heights on the surface of the photomask. To produce the focal map, the measured heights of the patterned areas are adjusted based on fill factors for the patterned areas. The photomask is inspected for defects, using the focal map.