The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Jun. 12, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Haifeng Huang, Livermore, CA (US);

Damon Kvamme, Los Gatos, CA (US);

Rui-Fang Shi, Cupertino, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/44 (2012.01); G01N 21/956 (2006.01); G03F 1/58 (2012.01); G01N 21/33 (2006.01); G03F 1/24 (2012.01); G01N 21/93 (2006.01);
U.S. Cl.
CPC ...
G03F 1/44 (2013.01); G01N 21/33 (2013.01); G01N 21/93 (2013.01); G01N 21/956 (2013.01); G03F 1/24 (2013.01); G03F 1/58 (2013.01); G01N 2021/95676 (2013.01);
Abstract

To calibrate a TDI photomask inspection tool, a photomask with a plurality of distinctly patterned regions is loaded into the tool. The plurality of distinctly patterned regions is successively illuminated with an EUV beam of light. While illuminating respective distinctly patterned regions, respective instances of imaging of the respective distinctly patterned regions are performed using a TDI sensor in the inspection tool. While performing the respective instances of imaging, a reference intensity detector is used to measure reference intensities of EUV light collected from the photomask. Based on the results of the respective instances of imaging and the measured reference intensities of EUV light, linearity of the TDI sensor is determined.


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