The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Mar. 04, 2008
Applicants:
Vinayak Dattatreya Phalke, Portland, OR (US);
GE Cong, Pleasanton, CA (US);
Lih-huah Yiin, Mountain View, CA (US);
Yalin Xiong, Union City, CA (US);
Inventors:
Vinayak Dattatreya Phalke, Portland, OR (US);
Ge Cong, Pleasanton, CA (US);
Lih-Huah Yiin, Mountain View, CA (US);
Yalin Xiong, Union City, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, detection of thin line or sub-resolution assist features may be used for selective sensitivity during photomask inspection. Other embodiments are also described.