Company Filing History:
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Years Active: 2006-2017
Title: Lih-Huah Yiin: Innovator in Reticle Inspection Technologies
Introduction
Lih-Huah Yiin is a prominent inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in reticle inspection technologies. With a total of 9 patents to his name, Yiin's work has advanced the methods used in the fabrication and inspection of photomasks.
Latest Patents
Yiin's latest patents include innovative methods that enhance the efficiency and accuracy of reticle inspections. One notable patent is the "Method and apparatus for database-assisted requalification reticle inspection." This method involves providing reticle design data that specifies both printable and non-printable features. A reduced design database is generated, which includes a description of non-printable features and a grayscale reticle image. This database is then used for periodic inspections in fabrication facilities.
Another significant patent is "Detection of thin lines for selective sensitivity during reticle inspection using processed images." This detection method constructs a band-limited spot image from optical images of the mask. It generates non-printable and printable feature maps, allowing for more precise defect detection on masks while reducing sensitivity in areas defined by non-printable features.
Career Highlights
Throughout his career, Lih-Huah Yiin has worked with notable companies in the semiconductor industry, including Kla Tencor Corporation and Kla-Tencor Technologies Corporation. His expertise in reticle inspection has positioned him as a key figure in advancing semiconductor manufacturing processes.
Collaborations
Yiin has collaborated with esteemed colleagues such as George Q Chen and Rui-Fang Shi. These partnerships have contributed to the development of innovative technologies in the field.
Conclusion
Lih-Huah Yiin's contributions to reticle inspection technologies have significantly impacted the semiconductor industry. His innovative patents and collaborations reflect his dedication to advancing manufacturing processes. His work continues to influence the future of semiconductor technology.