The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2007

Filed:

Mar. 24, 2003
Applicants:

Lih-huah Yiin, Mountain View, CA (US);

Yen-wen LU, Los Altos, CA (US);

George Q. Chen, Fremont, CA (US);

Inventors:

Lih-Huah Yiin, Mountain View, CA (US);

Yen-Wen Lu, Los Altos, CA (US);

George Q. Chen, Fremont, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G09G 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Faster and more accurate techniques for displaying images are described. The techniques can be applied in various applications that include semiconductor fabrication processes. The invention uses preprocessed images to generate a user-selected image in order to increase the speed of image processing. The invention displays the pixels forming an image using grayscale shading in order to improve the accuracy of displaying the patterns used in photolithography processes. The techniques of the present invention can be used to display images that represent lithography patterns stored within memory devices or to display images captured by inspection or metrology devices.


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