This inventor holds 1 USPTO granted patent. Top assignee: Kla Tencor Corporation. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Vinayak Dattatreya Phalke: Patent Inventor in Photomask Inspection.
Introduction
Vinayak Dattatreya Phalke is an inventor associated with Portland, Oregon, and KLA Tencor Corporation. His patent work concerns methods for inspecting photomasks used in semiconductor manufacturing.
Latest Patents
Phalke is named on 1 patent: “Detection of Thin Line for Selective Sensitivity During Reticle Inspection.” The patent describes methods and apparatus for photomask inspection, including detecting thin lines or sub-resolution assist features to enable selective sensitivity during inspection.
Career Highlights
Phalke’s listed invention addresses a specialized challenge in reticle inspection: identifying fine features while tailoring inspection sensitivity. This work is associated with KLA Tencor Corporation.
Collaborations
Phalke’s listed coworkers include Ge Cong and Yalin Xiong.
Conclusion
Vinayak Dattatreya Phalke’s patent contribution focuses on detecting fine photomask features and supporting selective sensitivity during reticle inspection.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile