The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Feb. 21, 2017
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Weston L. Sousa, San Jose, CA (US);
Yalin Xiong, Pleasanton, CA (US);
Carl E. Hess, Los Altos, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/84 (2012.01); G01N 21/956 (2006.01); G01N 21/88 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G01N 21/95607 (2013.01); G01N 21/8851 (2013.01); G03F 1/84 (2013.01); G06T 7/001 (2013.01); G01N 2021/8887 (2013.01); G01N 2021/95676 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Disclosed are methods and systems for inspecting photolithographic reticles. A first and second reticle that were fabricated with a same design are obtained. A first and second reticle image of the first and second reticles are also obtained. The first reticle image is compared to the second reticle image to output a difference image having a plurality of difference events corresponding to candidate defects on either the first or second reticle. An inspection report of the candidate defects is then generated.