Company Filing History:
Years Active: 1996-1998
Title: Innovations by Jack Y Jau
Introduction
Jack Y Jau is an accomplished inventor based in Fremont, CA. He has made significant contributions to the field of optical mask inspection technology. With a total of 3 patents to his name, Jau continues to push the boundaries of innovation in his industry.
Latest Patents
One of Jau's latest patents involves an apparatus for inspecting optical masks using electron beam microscopy. This innovative device scans an electron beam across an optical phase shift mask, automatically inspecting it to determine the features and classify defects. The apparatus directs an electron beam at the surface of the mask, utilizing detectors to measure secondary and backscattered charged particles. The mask is mounted on an x-y stage, allowing for at least one degree of freedom during scanning. By analyzing various waveform features from the secondary and backscatter electron waveforms, the apparatus can detect various physical features of the mask, including their size and position. Additionally, it can determine the thickness of chromium layers. The inspection configuration also includes a comparison technique for error detection by comparing the pattern on the substrate with a second pattern.
Career Highlights
Jack Y Jau is currently employed at Kla Instruments Corporation, where he continues to develop and refine his innovative technologies. His work has significantly impacted the field of optical inspection, enhancing the accuracy and efficiency of defect detection.
Collaborations
Some of Jau's notable coworkers include Dan Meisburger and Alan D Brodie. Their collaborative efforts contribute to the advancement of technology in their field.
Conclusion
Jack Y Jau is a prominent inventor whose work in optical mask inspection technology has led to significant advancements. His innovative patents and contributions continue to shape the industry and inspire future developments.