The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Jan. 28, 2021
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Roie Volkovich, Hadera, IL;
Liran Yerushalmi, Zicron Yaacob, IL;
Amnon Manassen, Haifa, IL;
Yoram Uziel, Yodfat, IL;
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/41 (2006.01); G01N 21/3563 (2014.01); G01N 21/956 (2006.01); G01B 9/02 (2022.01); G01N 21/45 (2006.01); G01N 21/25 (2006.01);
U.S. Cl.
CPC ...
G01N 21/4133 (2013.01); G01B 9/02 (2013.01); G01N 21/25 (2013.01); G01N 21/3563 (2013.01); G01N 21/45 (2013.01); G01N 21/956 (2013.01); G01N 2021/3568 (2013.01);
Abstract
A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.