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For the Inventor, By the Inventor

Hadera, Israel

Roie Volkovich

This inventor holds 35 USPTO granted patents and 3 published patent applications and 3 EPO patents, primarily in Semiconductor Metrology. Top assignees: Kla Tencor Corporation, Kla Corporation, Other. Active years: 2018-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roie Volkovich. Retrieved from https://idiyas.com/inventor/roie-volkovich

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 35 

% Patents Active = 91.4

 

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 28(Granted Patents)


Location History:

  • Milpitas, CA (US) (2021)
  • Migdal Ha'emek, IL (2021 - 2022)
  • Hadera, IL (2018 - 2024)

Company Filing History:

goldMedal18 out of 1,787 
 
Kla Tencor Corporation
 patents
silverMedal16 out of 620 
 
Kla Corporation
 patents
bronzeMedal1 out of 834,601 
Other
 patents

Years Active: 2018-2025

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Areas of Expertise:
Semiconductor Devices
Misregistration Measurement
Overlay Errors
Process Control
Metrology Systems
Dynamic Amelioration
Photoresist Properties
Zonal Analysis
Scatterometry
Direct Self Assembly
Exposure Parameters
Calibration
35 patents (USPTO):Explore Patents
1. 12393113 - Inter-step feedforward process control in the manufacture of semiconductor devices (2025-08-19),
2. 12347706 - Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein (2025-07-01),
3. 12222199 - Systems and methods for measurement of misregistration and amelioration thereof (2025-02-11),
4. 11971664 - Reducing device overlay errors (2024-04-30),
5. 11862521 - Multiple-tool parameter set calibration and misregistration measurement system and method (2024-01-02),
6. 11761969 - System and method for analyzing a sample with a dynamic recipe based on iterative experimentation and feedback (2023-09-19),
7. 11644419 - Measurement of properties of patterned photoresist (2023-05-09),
8. 11640117 - Selection of regions of interest for measurement of misregistration and amelioration thereof (2023-05-02),
9. 11635682 - Systems and methods for feedforward process control in the manufacture of semiconductor devices (2023-04-25),
10. 11551980 - Dynamic amelioration of misregistration measurement (2023-01-10),
11. 11532566 - Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices (2022-12-20),
12. 11467503 - Field-to-field corrections using overlay targets (2022-10-11),
13. 11454894 - Systems and methods for scatterometric single-wavelength measurement of misregistration and amelioration thereof (2022-09-27),
14. 11360398 - System and method for tilt calculation based on overlay metrology measurements (2022-06-14),
15. 11355375 - Device-like overlay metrology targets displaying Moiré effects (2022-06-07),

Title: The Innovative Mind of Roie Volkovich

Introduction: Roie Volkovich, a talented inventor hailing from Hadera, Israel, is a pioneering woman in the field of technological advancements and innovations.

Latest Patents: Roie Volkovich's latest patents showcase her dedication to pushing the boundaries of technology, with a focus on sustainability and efficiency in various industries.

Career Highlights: With a career marked by groundbreaking inventions, Roie Volkovich has consistently demonstrated her ability to transform ideas into tangible solutions that have a lasting impact on society.

Collaborations: Throughout her career, Roie Volkovich has collaborated with leading experts in the field, fostering a culture of innovation and knowledge-sharing that has led to remarkable advancements in technology.

Conclusion: Roie Volkovich's passion for innovation, coupled with her relentless drive to create a better future through her inventions, solidifies her as a true trailblazer in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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