The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

May. 06, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Roie Volkovich, Hadera, IL;

Liran Yerushalmi, Zicron Yaacob, IL;

Renan Milo, Rishon Lezion, IL;

Yoav Grauer, Haifa, IL;

David Izraeli, Haifa, IL;

Assignee:

KLA CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/4099 (2006.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G05B 19/4099 (2013.01); G05B 2219/45031 (2013.01);
Abstract

A method for process control in the manufacture of semiconductor devices including performing metrology on at least one semiconductor wafer included in a given lot of semiconductor wafers, following processing of the at least one semiconductor wafer by a first processing step, generating, based on the metrology, at least one correctable to a second processing step subsequent to the processing step and adjusting, based on the correctable, performance of the second processing step on at least some semiconductor waters of the given lot of semiconductor wafers.


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