The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2023
Filed:
Apr. 23, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/70 (2012.01); G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 7/70525 (2013.01); G03F 7/70616 (2013.01); G01B 11/24 (2013.01);
Abstract
A method for process control in the manufacture of semiconductor devices including performing metrology on at least one Design of Experiment (DOE) semiconductor wafer included in a lot of semiconductor wafers, the lot forming part of a batch of semiconductor wafer lots, generating, based on the metrology, one or more correctables to a process used to manufacture the lot of semiconductor wafers and adjusting, based on the correctables, the process performed on at least one of; other semiconductor wafers included in the lot of semi-conductor wafers, and other lots of semiconductor wafers included in the batch.