The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Jul. 16, 2020
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Roie Volkovich, Hadera, IL;

Liran Yerushalmi, Zircon Yaacob, IL;

Raviv Yohanan, Qiryat Motzkin, IL;

Mark Ghinovker, YoqneamIlit, IL;

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); G01B 11/27 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/682 (2013.01); G01B 11/272 (2013.01); G03F 7/70633 (2013.01);
Abstract

A metrology system and metrology methods are disclosed. The metrology system comprises a set of device features on a first layer of a sample, a first set of target features on a second layer of the sample and overlapping the set of device features, and a second set of target features on the second layer of the sample and overlapping the set of device features. Relative positions of a first set of Moiré fringes and a second set of Moiré fringes indicate overlay error between the first layer of the sample and the second layer of the sample.


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