The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Mar. 12, 2021
Kla Corporation, Milpitas, CA (US);
Enna Leshinsky-Altshuller, Kiryat-Byalik, IL;
Inna Tarshish-Shapir, Haifa, IL;
Mark Ghinovker, Yoqneam Ilit, IL;
Diana Shaphirov, Yoqneam Illit, IL;
Guy Ben Dov, Haifa, IL;
Roie Volkovich, Hadera, IL;
Chris Steely, Nampa, ID (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology system may include a controller to receive a first metrology dataset associated with a first set of metrology target features on a sample including first features from a first exposure field on a first sample layer and second features from a second exposure field on a second sample layer, where the second exposure field partially overlaps the first exposure field. The controller may further receive a second metrology dataset associated with a second set of metrology target features including third features from a third exposure field on the second layer that overlaps the first exposure field and fourth features formed from a fourth exposure field on the first layer of the sample that overlaps the second exposure field. The controller may further determine fabrication errors based on the first and second metrology datasets and generate correctables to adjust a lithography tool based on the fabrication errors.