Inna Tarshish-Shapir

Title: Inna Tarshish-Shapir: Innovator in Metrology Target Design

Introduction

Inna Tarshish-Shapir is a prominent inventor based in Haifa, Israel. She has made significant contributions to the field of metrology, particularly in the design and verification of metrology targets. With a total of six patents to her name, her work has advanced the accuracy and efficiency of metrology measurements in semiconductor manufacturing.

Latest Patents

Inna's latest patents include innovative methods for verification metrology targets and their design. These methods utilize Optical Critical Dimension (OCD) data to estimate discrepancies between target models and actual targets on wafers. By adjusting the metrology target design model based on these discrepancies, her work enables higher fidelity in metrology target design and ultimately enhances the accuracy of measurements. Another notable patent involves field-to-field corrections using overlay targets, where a metrology system can determine fabrication errors based on multiple metrology datasets. This allows for adjustments to lithography tools, improving the overall manufacturing process.

Career Highlights

Inna has worked with notable companies in the industry, including Kla Tencor Corporation and Kla Corporation. Her experience in these organizations has allowed her to collaborate with leading experts in the field and contribute to groundbreaking advancements in metrology.

Collaborations

Inna has collaborated with talented individuals such as Mark Ghinovker and Yoel Feler. These partnerships have fostered innovation and have been instrumental in the development of her patented technologies.

Conclusion

Inna Tarshish-Shapir is a trailblazer in the field of metrology, with her patents reflecting her commitment to enhancing measurement accuracy in semiconductor manufacturing. Her contributions continue to influence the industry and pave the way for future innovations.