The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2019

Filed:

Jan. 10, 2014
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Inna Tarshish-Shapir, Haifa, IL;

Yoel Feler, Haifa, IL;

Anat Marchelli, Kiryat Yam, IL;

Berta Dinu, Migdal Haemek, IL;

Vladimir Levinski, Migdal HaEmek, IL;

Boris Efraty, Carmiel, IL;

Nuriel Amir, St. Yokneam, IL;

Mark Ghinovker, Yoqneam Ilit, IL;

Amnon Manassen, Haifa, IL;

Sigalit Robinzon, Timrat, IL;

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/28 (2006.01); G06K 9/52 (2006.01); G06T 7/00 (2017.01); H01L 21/66 (2006.01); G01N 21/47 (2006.01);
U.S. Cl.
CPC ...
G06K 9/522 (2013.01); G01N 21/4788 (2013.01); G06T 7/0004 (2013.01); H01L 22/12 (2013.01); G01B 2210/56 (2013.01); G06T 2207/30148 (2013.01); H01L 22/30 (2013.01);
Abstract

Methods and systems are provided, which identify specified metrology target abnormalities using selected metrics and classify the identified target abnormalities geometrically to link them to corresponding sources of error. Identification may be carried out by deriving target signals such as kernels from specified regions of interest (ROIs) from corresponding targets on a wafer, calculating the metrics from the target signals using respective functions and analyzing the metrics to characterize the targets.


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