Enna Leshinsky-Altshuller

Title: Enna Leshinsky-Altshuller: Innovator in Metrology Systems

Introduction

Enna Leshinsky-Altshuller is a notable inventor based in Kiryat Byalik, Israel. She has made significant contributions to the field of metrology systems, holding 2 patents that enhance the precision of lithography tools. Her work is instrumental in improving fabrication processes in various technological applications.

Latest Patents

One of her latest patents focuses on field-to-field corrections using overlay targets. This metrology system includes a controller that receives a first metrology dataset associated with a first set of metrology target features on a sample. The sample includes first features from a first exposure field on a first sample layer and second features from a second exposure field on a second sample layer, where the second exposure field partially overlaps the first exposure field. The controller also receives a second metrology dataset associated with a second set of metrology target features, which includes third features from a third exposure field on the second layer that overlaps the first exposure field and fourth features formed from a fourth exposure field on the first layer of the sample that overlaps the second exposure field. The controller determines fabrication errors based on the first and second metrology datasets and generates correctables to adjust a lithography tool based on these errors.

Another patent by Enna also addresses field-to-field corrections using overlay targets. In this system, a controller is coupled to a metrology tool. The controller receives a metrology target design that includes at least a first feature formed by exposing a first exposure field on a sample with a lithography tool, and at least a second feature formed by exposing a second exposure field on the sample. The second exposure field overlaps the first exposure field at a location of a metrology target on the sample. The controller receives metrology data associated with the fabricated metrology target, determines fabrication errors during the target's fabrication, and generates correctables to adjust fabrication parameters of the lithography tool in subsequent lithography steps.

Career Highlights

Enna Leshinsky-Altshuller is currently employed at Kla Corporation, where she continues to innovate in the field of metrology. Her work is crucial for enhancing the accuracy and efficiency of lithography processes, which are vital in semiconductor manufacturing.

Collaborations

Enna collaborates with talented individuals such as Inna Tarshish-Shapir