The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Jul. 05, 2018
Kla-tencor Corporation, Milpitas, CA (US);
Tal Marciano, Zychron Yaacov, IL;
Nadav Gutman, Zichron Ya'aqov, IL;
Yuri Paskover, Binyamina, IL;
Guy Cohen, Yaafa, IL;
Vladimir Levinski, Migdal HaEmek, IL;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Metrology methods are provided for deriving metrology measurement parameter value(s) by identifying the value(s) in which the corresponding metrology measurement signal(s) have minimal amplitude asymmetry. Selecting the measurement parameter values as disclosed reduces significantly the measurement inaccuracy. For example, wavelength values and/or focus values may be detected to indicate minimal amplitude asymmetry and/or minimal phase asymmetry. In certain embodiments, wavelength values which provide minimal amplitude asymmetry also provide minimal signal sensitivity to focus. Developed metrics may be further used to indicate process robustness across wafers and lots. In some embodiments, imaging accuracy may be enhanced by through-focus landscaping of the amplitude asymmetry and detection of parameters values with minimal amplitude asymmetry.