Company Filing History:
Years Active: 2018-2025
Title: Innovations of Yuval Lubashevsky
Introduction
Yuval Lubashevsky is a prominent inventor based in Haifa, Israel. He holds a total of 12 patents, showcasing his significant contributions to the field of overlay metrology. His work has advanced the technology used in various applications, particularly in the semiconductor industry.
Latest Patents
One of his latest patents is focused on a scanning scatterometry overlay metrology system. This system includes an illumination source that generates an illumination beam, along with optics that direct this beam to an overlay target on a sample. As the sample is scanned relative to the illumination beam, the target features cells with Moiré structures. The system utilizes two photodetectors positioned at a pupil plane to capture time-varying interference signals, which are then used to generate overlay measurements.
Another notable patent involves a system and method for overlay metrology using a phase mask. This system comprises a controller with processors that execute program instructions. These processors receive pupil images of light collected from an overlay target and a known phase distribution introduced to the illumination beam. They model an intensity function that relates the pupil images, the known phase distribution, and decentered shift parameters of the overlay target structures. The processors then fit the pupil images to this intensity function and generate an overlay measurement based on the fit.
Career Highlights
Yuval Lubashevsky has worked with notable companies in the