The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Mar. 30, 2022
Kla Corporation, Milpitas, CA (US);
Amnon Manassen, Haifa, IL;
Andrew V. Hill, Berkeley, CA (US);
Yuri Paskover, Milpitas, CA (US);
Itay Gdor, Tel-Aviv, IL;
Yonatan Vaknin, Yoqneam Llit, IL;
Yuval Lubashevsky, Haifa, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
An overlay metrology system may include an illumination an illumination source to generate an illumination beam, one or more illumination optics to direct the illumination beam to an overlay target on a sample as the sample is scanned relative to the illumination beam along a scan direction, the target including one or more cells having Moiré structures. The system may also include two photodetectors at locations of a pupil plane associated with Moiré or overlapping diffraction orders from the Moiré structures. The system may then generate overlay measurements based on time-varying interference signals captured by the detector as the sample is scanned.