The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2024
Filed:
Jan. 25, 2022
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Itay Gdor, Halevi, IL;
Yuval Lubashevsky, Haifa, IL;
Alon Alexander Volfman, Migdal Haemek, IL;
Daria Negri, Haifa, IL;
Yevgeniy Men, Milpitas, CA (US);
Elad Farchi, Pardes Hana-Karkur, IL;
Assignee:
KLA Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01N 21/21 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G01N 21/211 (2013.01); G03F 7/706849 (2023.05); H01L 22/12 (2013.01);
Abstract
Metrology is performed on a semiconductor wafer using a system with an apodizer. A spot is formed on the semiconductor wafer with a diameter from 2 nm to 5 nm. The associated beam of light has a wavelength from 400 nm to 800 nm. Small target measurement can be performed at a range of optical wavelengths.