Company Filing History:
Years Active: 2024-2025
Title: Innovations by Yevgeniy Men
Introduction
Yevgeniy Men is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of metrology, particularly in the semiconductor industry. With a total of 2 patents, his work focuses on advanced measurement techniques that enhance the precision of semiconductor manufacturing.
Latest Patents
Yevgeniy Men holds two recent patents that showcase his innovative approach. The first patent is titled "System and method for isolation of specific Fourier pupil frequency in overlay metrology." This system includes an illumination source that generates an illumination beam, along with a collection sub-system featuring an objective lens, detectors, a light modulator, and a controller. The controller executes a metrology recipe by processing detection signals from the detectors to generate overlay measurements associated with multiple layers of a sample.
The second patent is "Annular apodizer for small target overlay measurement." This invention involves performing metrology on a semiconductor wafer using a system equipped with an apodizer. It allows for the formation of a spot on the wafer with a diameter ranging from 2 nm to 5 nm, utilizing a beam of light with wavelengths between 400 nm and 800 nm. This technology enables small target measurements across various optical wavelengths.
Career Highlights
Yevgeniy Men is currently employed at Kla Corporation, where he continues to develop innovative solutions in metrology. His expertise in the field has positioned him as a valuable asset to the company and the industry at large.
Collaborations
Throughout his career, Yevgeniy has collaborated with talented individuals such as Yuval Lubashevsky and Itay Gdor. These collaborations have further enriched his work and contributed to the advancement of metrology technologies.
Conclusion
Yevgeniy Men is a distinguished inventor whose contributions to metrology have significantly impacted the semiconductor industry. His innovative patents reflect his commitment to enhancing measurement techniques, making him a key figure in his field.