Kla Corporation

Yevgeniy Men

Yuval Lubashevsky

Daria Negri

Itay Gdor

Yoram Uziel

Alexander Volfman

Yuri Paskover

Elad Farchi

A system includes an illumination source configured to generate an illumination beam, and a collection sub-system that includes an objective lens, one or more detectors located at a collection pupil plane, a light modulator, and a controller. The light modulator is configured to direct one or more selected portions of measurement light to the one or more detectors. The controller includes one or more processors configured to execute program instructions causing the one or more processors to execute a metrology recipe by: receiving detection signals from the one or more detectors, wherein the detection signals are associated with the one or more selected portions of the measurement light directed to the one or more detectors; and generating an overlay measurement associated with at least two layers of a sample based on the detection signals.

System and method for isolation of specific fourier pupil frequency in overlay metrology

Metrology is performed on a semiconductor wafer using a system with an apodizer. A spot is formed on the semiconductor wafer with a diameter from 2 nm to 5 nm. The associated beam of light has a wavelength from 400 nm to 800 nm. Small target measurement can be performed at a range of optical wavelengths.

Annular apodizer for small target overlay measurement

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Milpitas, CA, United States of America

Yevgeniy Men