The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Jun. 01, 2023
Kla Corporation, Milpitas, CA (US);
Inna Steely-Tarshish, Yokneam Ilit, IL;
Stefan Eyring, Weilburg, DE;
Mark Ghinovker, Yoqneam Ilit, IL;
Yoel Feler, Haifa, IL;
Eitan Hajaj, Ashqelon, IL;
Ulrich Pohlmann, Jena, DE;
Nadav Gutman, Zichron Ya'aqov, IL;
Chris Steely, Yokneam Ilit, IL;
Raviv Yohanan, Qiryat Motzkin, IL;
Ira Naot, Milpitas, CA (US);
Abstract
Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.