Ulrich Pohlmann

Title: Innovations of Ulrich Pohlmann in Electron Beam Overlay Technology

Introduction

Ulrich Pohlmann is a notable inventor based in Jena, Germany, recognized for his contributions to the field of semiconductor metrology. With a total of 10 patents to his name, Pohlmann has made significant advancements in electron beam overlay technology, which is crucial for the precision required in semiconductor manufacturing.

Latest Patents

Pohlmann's latest patents include innovative designs for overlay marks used in electron beam overlay measurements. One of his patents describes a target that features a plurality of electron beam overlay elements and two-dimensional elements, which facilitate advanced imaging. This target includes an array of evenly-spaced polygonal gratings arranged in multiple rows and columns. Another patent focuses on a target that incorporates electron beam overlay elements and AIMid elements, each consisting of gratings oriented perpendicularly to one another. These designs enhance the accuracy of overlay measurements, which are essential for semiconductor fabrication.

Career Highlights

Throughout his career, Ulrich Pohlmann has worked with prominent companies in the semiconductor industry, including KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of metrology tools used in the industry.

Collaborations

Pohlmann has collaborated with notable professionals in his field, including Nadav Gutman and Stefan Eyring. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in electron beam overlay.

Conclusion

Ulrich Pohlmann's work in electron beam overlay technology has significantly impacted the semiconductor industry. His patents and collaborations reflect his commitment to advancing metrology techniques, ensuring precision in semiconductor manufacturing.