The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
May. 14, 2018
Kla-tencor Corporation, Milpitas, CA (US);
Nadav Gutman, Zichron Ya'aqov, IL;
Eran Amit, Haifa, IL;
Stefan Eyring, Weilburg, DE;
Hari Pathangi, Chennai, IN;
Frank Laske, Weilburg, DE;
Ulrich Pohlmann, Jena, DE;
Thomas Heidrich, Weilburg, DE;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
An overlay metrology system includes a particle-beam metrology tool to scan a particle beam across an overlay target on a sample including a first-layer target element and a second-layer target element. The overlay metrology system may further include a controller to receive a scan signal from the particle-beam metrology tool, determine symmetry measurements for the scan signal with respect to symmetry metrics, and generate an overlay measurement between the first layer and the second layer based on the symmetry measurements in which an asymmetry of the scan signal is indicative of a misalignment of the second-layer target element with respect to the first-layer target element and a value of the overlay measurement is based on the symmetry measurements.