Weilburg, Germany

Frank Laske

USPTO Granted Patents = 18 

 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 44(Granted Patents)


Location History:

  • Weilmuenster, DE (2013 - 2017)
  • Weilmunster, DE (2018)
  • Weilmünster, DE (2019)
  • Weilburg, DE (2011 - 2024)

Company Filing History:


Years Active: 2011-2025

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18 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Frank Laske

Introduction

Frank Laske is a prominent inventor based in Weilburg, Germany, known for his significant contributions to the field of wafer metrology. With a total of 18 patents to his name, Laske has made remarkable advancements that enhance the precision and efficiency of semiconductor manufacturing processes.

Latest Patents

Among his latest patents is the "Image modeling-assisted contour extraction," which involves a wafer metrology tool, such as a scanning electron microscope. This invention generates an image of a structure on a wafer and compares it with a simulated image derived from the wafer's design. The contours of both images are analyzed to ensure accuracy in the manufacturing process. Another notable patent is the "Device feature specific edge placement error (EPE)," which outlines a system and method for generating metrology measurements using an optical sub-system. This method includes a training phase that utilizes first metrology data to create critical dimensions and bin device features, followed by a run-time operation that generates real-time metrology measurements.

Career Highlights

Frank Laske has had a distinguished career, working with leading companies in the semiconductor industry, including Kla Tencor Corporation and Kla Corporation. His expertise in metrology and imaging technologies has positioned him as a key figure in advancing the capabilities of wafer inspection and measurement.

Collaborations

Throughout his career, Laske has collaborated with notable professionals in the field, including Stefan Eyring and Nadav Gutman. These partnerships have contributed to the development of innovative solutions that address complex challenges in semiconductor manufacturing.

Conclusion

Frank Laske's contributions to wafer metrology through his patents and collaborations have significantly impacted the semiconductor industry. His work continues to drive innovation and improve manufacturing processes, solidifying his reputation as a leading inventor in this field.

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