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Weilburg, Germany

Vistec Semiconductor Systems Gmbh

USPTO Granted Patents = 64

EPO Patents = 1

Trademarks = 2

Forward Citations = 235

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54 inventors (with patents filed for the assignee):

Michael Heiden (16 out of 21 patents)

Albert Kreh (9 out of 13 patents)

Klaus Rinn (9 out of 19 patents)

4. Detlef Michelsson (8 out of 10 patents)

5. Henning Backhauss (8 out of 10 patents)

6. Hans-Artur Boesser (6 out of 8 patents)

7. Klaus-Dieter Adam (6 out of 8 patents)

8. Andreas Schaaf (4 out of 4 patents)

9. Lambert Danner (4 out of 14 patents)

10. Wolfgang Fricke (4 out of 5 patents)

11. Tillmann Ehrenberg (4 out of 4 patents)

12. Slawomir Czerkas (3 out of 5 patents)

13. Wolfgang Vollrath (2 out of 6 patents)

14. Michael Hofmann (2 out of 2 patents)

15. Walter Steinberg (2 out of 2 patents)

Core Competencies:

Wafer Inspection

Coordinate Measuring Machine

Optical Inspection

Image Processing

Defect Detection

Substrate Measurement

Polarization Degree

Interferometric Device

Mask Positioning

Geometrical Characteristics

Structured Illumination

Measurement Calibration

64 patents: Sort by Forward Citations

1. 8390927 - Element for homogenizing the illumination with simultaneous setting of the polarization degree (2013-03-05),

2. 8351049 - Interferometric device for position measurement and coordinate measuring machine (2013-01-08),

3. 8264534 - Method and apparatus for processing the image data of the surface of a wafer recorded by at least one camera (2012-09-11),

4. 8248618 - Method for determining positions of structures on a mask (2012-08-21),

5. 8200004 - Method for inspecting a surface of a wafer with regions of different detection sensitivity (2012-06-12),

6. 8200003 - Method for the optical inspection and visualization of optical measuring values obtained from disk-like objects (2012-06-12),

7. 8154718 - Apparatus and method for inspecting micro-structured devices on a semiconductor substrate (2012-04-10),

8. 8149383 - Method for determining the systematic error in the measurement of positions of edges of structures on a substrate resulting from the substrate topology (2012-04-03),

9. 8115808 - Coordinate measuring machine and method for calibrating the coordinate measuring machine (2012-02-14),

10. 8102541 - Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures (2012-01-24),

11. 8090185 - Method for optical inspection, detection and visualization of defects on disk-shaped objects (2012-01-03),

12. 8089622 - Device and method for evaluating defects in the edge area of a wafer and use of the device in inspection system for wafers (2012-01-03),

13. 8087799 - Illumination means and inspection means having an illumination means (2012-01-03),

14. 8056434 - Advancing means for a multi-coordinate measurement table of a coordinate measuring device and method for controlling such an advancing means (2011-11-15),

15. 7986409 - Method for determining the centrality of masks (2011-07-26),

Vistec Semiconductor Systems GmbH is a leading provider of cutting-edge electron beam lithography systems for the semiconductor industry. With superior technology and innovation, Vistec delivers advanced solutions that enable the production of smaller, faster, and more efficient microchips. Their high-precision lithography systems are trusted by major semiconductor manufacturers worldwide.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

64 Patents

#1 in Weilburg

#891 in Germany

#11,009 in the World

Weilburg, Germany

Vistec Semiconductor Systems Gmbh

Forward Citations = 235

54 inventors:

Michael Heiden (16 out of 21 patents)

Albert Kreh (9 out of 13 patents)

Klaus Rinn (9 out of 19 patents)

4. Detlef Michelsson (8 out of 10 patents)

5. Henning Backhauss (8 out of 10 patents)

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