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For the Inventor, By the Inventor

Woelfersheim, Germany

Michael Heiden

This inventor holds 21 USPTO granted patents and 3 published patent applications, primarily in Optical Inspection Technology. Top assignees: Vistec Semiconductor Systems Gmbh, Kla-Tencor Mie Gmbh, Leica Microsystems Cms Gmbh. Active years: 2008-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael Heiden. Retrieved from https://idiyas.com/inventor/michael-heiden

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 71.4

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 28(Granted Patents)


Location History:

  • Woelfershelm, DE (2009 - 2011)
  • Woelfersheim, DE (2008 - 2013)
  • Wolfersheim, DE (2010 - 2013)

Company Filing History:

goldMedal18 out of 72 
 
Vistec Semiconductor Systems Gmbh
 patents
silverMedal2 out of 7 
 
Kla-Tencor Mie Gmbh
 patents
bronzeMedal1 out of 550 
 
Leica Microsystems Cms Gmbh
 patents

Years Active: 2008-2013

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Areas of Expertise:
Wafer Inspection
Coordinate Measuring Machine
Illumination Apparatus
Optical Properties
Measurement Correction
Error Detection
Photoresist Structures
Geometrical Characteristics
Quality Factors
Structured Illumination
Lens Distortion
Surface Inspection
21 patents (USPTO):Explore Patents
1. 8582113 - Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device (2013-11-12),
2. 8390927 - Element for homogenizing the illumination with simultaneous setting of the polarization degree (2013-03-05),
3. 8305587 - Apparatus for the optical inspection of wafers (2012-11-06),
4. 8154595 - Device and method for automatic detection of incorrect measurements by means of quality factors (2012-04-10),
5. 8102541 - Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures (2012-01-24),
6. 7986409 - Method for determining the centrality of masks (2011-07-26),
7. 7978340 - System and method for determining positions of structures on a substrate (2011-07-12),
8. 7961334 - Coordinate measuring machine for measuring structures on a substrate (2011-06-14),
9. 7939789 - Method for reproducibly determining geometrical and/or optical object characteristics (2011-05-10),
10. 7929149 - Coordinate measuring machine and a method for correcting non-linearities of the interferometers of a coordinate measuring machine (2011-04-19),
11. 7903259 - Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device (2011-03-08),
12. 7889338 - Coordinate measuring machine and method for structured illumination of substrates (2011-02-15),
13. 7864319 - Device and method for determining an optical property of a mask (2011-01-04),
14. 7769556 - Method for correcting measuring errors caused by the lens distortion of an objective (2010-08-03),
15. 7694426 - Method for eliminating sources of error in the system correction of a coordinate measuring machine (2010-04-13),

Title: The Innovative Contributions of Michael Heiden

Introduction

Michael Heiden, hailing from Woelfersheim, Germany, is a prominent inventor with a remarkable portfolio of 21 patents. His innovations primarily focus on optical technologies and systems that enhance measurements and illuminate structures accurately.

Latest Patents

Among his most recent patents are inventions that greatly contribute to the field of positioning and illumination. The first patent is a device designed for determining the position of structures on an object in relation to a coordinate system. This device involves a measuring table that can move within a defined plane, equipped with an optical arrangement for both transmitted and reflected light illumination. The invention emphasizes the use of encapsulated optical components that facilitate precise measurement.

Another notable patent is the element for homogenizing illumination while simultaneously setting the degree of polarization. This innovative element consists of a microlens array and a filter that adjusts the desired polarization, showcasing Heiden's dedication to enhancing optical technologies.

Career Highlights

Michael Heiden has demonstrated significant professional achievements throughout his career. He has contributed his expertise to esteemed companies in the industry, including Vistec Semiconductor Systems GmbH and Kla-Tencor Mie GmbH. His work in these organizations underlines his commitment to advancing optical technologies and their applications.

Collaborations

During his career, Heiden has collaborated with notable coworkers such as Klaus Rinn and Hans-Artur Boesser. These partnerships have allowed him to leverage collective expertise and foster innovation in his inventions.

Conclusion

Michael Heiden's contributions to the fields of optics and measurements are impressive, as evidenced by his extensive list of patents and collaborations. His work not only exemplifies innovative thinking but also highlights the importance of teamwork in achieving significant advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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