The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Jan. 15, 2008
Michael Heiden, Wolfersheim, DE;
Michael Heiden, Wolfersheim, DE;
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Abstract
An apparatus () for measuring structures () on a mask () and for calculating structures in a photoresist on a wafer resulting from the structures () on the mask () is disclosed, wherein the apparatus () comprises at least one incident-light illumination means () and/or one transmitted-light illumination means (), wherein the apparatus () comprises at least one imaging optics () and a detector () of a camera () for imaging the structures () on the mask (), wherein a first computer program () is associated with the detector () of the camera () and provided for determining the position and/or the dimension of the structure () on the mask (). A method for measuring structures () on a mask () and for calculating structures in a photoresist on a wafer to be expected from the structures () on the mask () is also disclosed.