The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
Jul. 18, 2008
Michael Heiden, Woelfersheim, DE;
Michael Heiden, Woelfersheim, DE;
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Abstract
A method and a coordinate measuring machine () are provided, wherein the non-linearities of an interferometer () can be corrected. A measuring stage () traversable in a plane () is provided for measurement. The substrate () is placed in a measuring stage (); wherein the position of the measuring stage () along each of the motion axes is determined by at least one interferometer () in each case. A computer () is provided for compensating the non-linearity inherent in each of the interferometers (), wherein the position of the measuring stage () to be determined by the interferometers () is arranged along a trajectory () of the measuring stage (), which is composed at least partially of components of the axes.