The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Dec. 04, 2008
Detlef Michelsson, Wetzlar-Naunheim, DE;
Detlef Michelsson, Wetzlar-Naunheim, DE;
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Abstract
A method for processing the image data of the surface of a wafer () recorded by at least one camera () is disclosed, wherein an image field () is defined for each camera () in such a way that the recorded image content is repeated after N recorded images. In an evaluation electronics () M utility programs () are determined, wherein M is equal to the number of recorded images after which the image content is repeated. The number M of utility programs () is adapted to the number N of images. Each of the M utility programs () of the plurality of recorded images is only fed with images having the same image contents in order to detect defects on the basis of the image contents of the images of the surface of the wafer. The results of the M utility programs () are respectively forwarded to a central program () in a sequential manner, which compiles a distribution of the defects present on the surface of the wafer () from the individual results of the M utility programs ().