The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2012

Filed:

Feb. 28, 2008
Applicants:

Andreas Birkner, Jena, DE;

Michael Hofmann, Heuchelheim, DE;

Wolfgang Vollrath, Burbach, DE;

Inventors:

Andreas Birkner, Jena, DE;

Michael Hofmann, Heuchelheim, DE;

Wolfgang Vollrath, Burbach, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
Abstract

A device for evaluating defects in the edge area of a wafer () is disclosed. The evaluation may also be performed automatically. In particular, the device includes three cameras (), each provided with an objective (), wherein a first camera () is arranged such that the first camera () is opposite to an edge area on the upper surface () of the wafer (), wherein a second camera () is arranged such that the second camera () is opposite to a front surface () of the wafer (), and wherein a third camera () is arranged such that the third camera () is opposite to an edge area on the lower surface () of the wafer ().


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