Wetzlar-Naunheim, Germany

Lambert Danner


Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 119(Granted Patents)


Location History:

  • Wetzlar-Naunheim, DE (2003 - 2012)
  • Wetzlar, DE (2008 - 2013)
  • Vienna, AU (2015)

Company Filing History:


Years Active: 2003-2015

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14 patents (USPTO):Explore Patents

Title: The Innovations of Lambert Danner

Introduction

Lambert Danner is a notable inventor based in Wetzlar-Naunheim, Germany. He has made significant contributions to the field of optical technology, holding a total of 14 patents. His work primarily focuses on methods and apparatuses for optical inspection and measurement.

Latest Patents

Danner's latest patents include a method for focusing an object plane and an optical assembly designed for this purpose. This method involves positioning a geometric reference structure in a plane conjugate to a field plane of an objective, allowing for precise imaging onto the object plane. The method utilizes a light beam that forms a non-zero angle with the normal direction of the conjugate plane, enabling the determination of the focus position based on the signed distance between the object plane and the field plane. Another significant patent is for an apparatus for the optical inspection of wafers. This apparatus features an assembly unit that carries optical elements for both bright field and dark field illumination, ensuring that all illumination and detection paths are telecentric.

Career Highlights

Throughout his career, Lambert Danner has worked with prominent companies in the semiconductor industry, including Leica Microsystems Semiconductor GmbH and Vistec Semiconductor Systems GmbH. His expertise in optical technologies has made him a valuable asset in these organizations.

Collaborations

Danner has collaborated with notable colleagues such as Franz Cemic and Uwe Graf, contributing to advancements in optical measurement and inspection technologies.

Conclusion

Lambert Danner's innovative work in optical technology has led to numerous patents that enhance the precision of optical inspections and measurements. His contributions continue to influence the field significantly.

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