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Wetzlar, Germany

Leica Microsystems Semiconductor Gmbh

USPTO Granted Patents = 23

Forward Citations = 222

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26 inventors (with patents filed for the assignee):

Ulrich Kaczynski (6 out of 15 patents)

Gerhard Hoppen (4 out of 5 patents)

Klaus Rinn (4 out of 19 patents)

4. Lambert Danner (4 out of 14 patents)

5. Franz Cemic (4 out of 5 patents)

6. Carola Blaesing-Bangert (3 out of 7 patents)

7. Albert Kreh (2 out of 13 patents)

8. Joachim Wienecke (2 out of 18 patents)

9. Michael Veith (2 out of 6 patents)

10. Martin Osterfeld (1 out of 6 patents)

11. Wolfgang Vollrath (1 out of 6 patents)

12. Detlef Michelsson (1 out of 10 patents)

13. Roland Hedrich (1 out of 5 patents)

14. Henning Backhauss (1 out of 10 patents)

15. Edgar Maehringer-Kunz (1 out of 7 patents)

23 patents: Sort by Forward Citations

1. 7417719 - Method, device and software for the optical inspection of a semi-conductor substrate (2008-08-26),

2. 7375792 - Apparatus for measuring feature widths on masks for the semiconductor industry (2008-05-20),

3. 7209243 - Illumination device, and coordinate measuring instrument having an illumination device (2007-04-24),

4. 7180585 - Apparatus for wafer inspection (2007-02-20),

5. 7152488 - System operating unit (2006-12-26),

6. 7081963 - Substrate holder, and use of the substrate holder in a highly accurate measuring instrument (2006-07-25),

7. 7050223 - DUV-capable microscope objective with parfocal IR focus (2006-05-23),

8. 7019910 - Inspection microscope and objective for an inspection microscope (2006-03-28),

9. 7005638 - Apparatus and method for reducing the electron-beam-induced deposition of contamination products (2006-02-28),

10. 6975409 - Illumination device; and coordinate measuring instrument having an illumination device (2005-12-13),

11. 6960755 - Contact sensor, and apparatus for protecting a protruding component (2005-11-01),

12. 6943901 - Critical dimension measuring instrument (2005-09-13),

13. 6924900 - Method and microscope for detection of a specimen (2005-08-02),

14. 6920249 - Method and measuring instrument for determining the position of an edge of a pattern element on a substrate (2005-07-19),

15. 6919658 - Coordinate measuring stage (2005-07-19),

Leica Microsystems Semiconductor GmbH focuses on delivering advanced semiconductor inspection solutions for research, development, and production. With cutting-edge technologies, innovative products, and exceptional customer service, they assist semiconductor manufacturers in achieving high process control and yield management. Leica Microsystems Semiconductor GmbH is dedicated to enabling the production of reliable, high-quality semiconductor devices.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

23 Patents

#9 in Wetzlar

#2,005 in Germany

#26,826 in the World

Wetzlar, Germany

Leica Microsystems Semiconductor Gmbh

Forward Citations = 222

26 inventors:

Ulrich Kaczynski (6 out of 15 patents)

Gerhard Hoppen (4 out of 5 patents)

Klaus Rinn (4 out of 19 patents)

4. Lambert Danner (4 out of 14 patents)

5. Franz Cemic (4 out of 5 patents)

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