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Wetzlar, Germany

Leica Microsystems Semiconductor Gmbh

USPTO Granted Patents = 23

% Expired Patents = 26.1

Forward Citations = 222

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26 inventors (with patents filed for the assignee):

Ulrich Kaczynski (6 out of 15 patents)

Gerhard Hoppen (4 out of 5 patents)

Klaus Rinn (4 out of 19 patents)

4. Lambert Danner (4 out of 14 patents)

5. Franz Cemic (4 out of 5 patents)

6. Carola Blaesing-Bangert (3 out of 7 patents)

7. Albert Kreh (2 out of 13 patents)

8. Joachim Wienecke (2 out of 18 patents)

9. Michael Veith (2 out of 6 patents)

10. Martin Osterfeld (1 out of 6 patents)

11. Wolfgang Vollrath (1 out of 6 patents)

12. Detlef Michelsson (1 out of 10 patents)

13. Roland Hedrich (1 out of 5 patents)

14. Henning Backhauss (1 out of 10 patents)

15. Edgar Maehringer-Kunz (1 out of 7 patents)

23 patents: Sort by Forward Citations

1. 7417719 - Method, device and software for the optical inspection of a semi-conductor substrate (2008-08-26),

2. 7375792 - Apparatus for measuring feature widths on masks for the semiconductor industry (2008-05-20),

3. 7209243 - Illumination device, and coordinate measuring instrument having an illumination device (2007-04-24),

4. 7180585 - Apparatus for wafer inspection (2007-02-20),

5. 7152488 - System operating unit (2006-12-26),

6. 7081963 - Substrate holder, and use of the substrate holder in a highly accurate measuring instrument (2006-07-25),

7. 7050223 - DUV-capable microscope objective with parfocal IR focus (2006-05-23),

8. 7019910 - Inspection microscope and objective for an inspection microscope (2006-03-28),

9. 7005638 - Apparatus and method for reducing the electron-beam-induced deposition of contamination products (2006-02-28),

10. 6975409 - Illumination device; and coordinate measuring instrument having an illumination device (2005-12-13),

11. 6960755 - Contact sensor, and apparatus for protecting a protruding component (2005-11-01),

12. 6943901 - Critical dimension measuring instrument (2005-09-13),

13. 6924900 - Method and microscope for detection of a specimen (2005-08-02),

14. 6920249 - Method and measuring instrument for determining the position of an edge of a pattern element on a substrate (2005-07-19),

15. 6919658 - Coordinate measuring stage (2005-07-19),

Company Overview

Leica Microsystems Semiconductor GmbH, based in Wetzlar, Germany, specializes in advanced optical and imaging technologies tailored for the semiconductor industry. The company focuses on developing high-precision microscopy solutions that enhance the manufacturing and inspection processes of semiconductor devices. With a commitment to innovation, Leica Microsystems plays a crucial role in enabling advancements in microelectronics, contributing to the evolution of technology across various sectors.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

23 Patents

#9 in Wetzlar

#1,985 in Germany

#27,714 in the World

Wetzlar, Germany

Leica Microsystems Semiconductor Gmbh

Forward Citations = 222

26 inventors:

Ulrich Kaczynski (6 out of 15 patents)

Gerhard Hoppen (4 out of 5 patents)

Klaus Rinn (4 out of 19 patents)

4. Lambert Danner (4 out of 14 patents)

5. Franz Cemic (4 out of 5 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Leica Microsystems Semiconductor Gmbh. Retrieved from https://idiyas.com/company/leica-microsystems-semiconductor

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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