The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
May. 17, 2004
Albert Kreh, Solms, DE;
Henning Backhauss, Wetzlar, DE;
Albert Kreh, Solms, DE;
Henning Backhauss, Wetzlar, DE;
Leica Microsystems Semiconductor GmbH, Wetzlar, DE;
Abstract
An apparatus for wafer inspection is described, comprising an incident-light illumination device () having an illumination axis and an imaging device () having an image axis, both of which are inclined with respect to one another and are directed onto a region to be inspected of the surface () of a wafer (). According to the present invention, the apparatus is characterized in that the incident-light illumination device () and the imaging device () each have associated with them a polarizing means whose transmission axes are oriented at a predetermined angle to one another.