The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2003
Filed:
May. 02, 2001
Hakon Mikkelsen, Magdala, DE;
Horst Engel, Giessen, DE;
Lambert Danner, Wetzlar-Naunheim, DE;
Christof Stey, Wetzlar, DE;
Leica Microsystems Jena GmbH, Jena, DE;
Abstract
The invention concerns an optical measurement arrangement having an ellipsometer, in which an incident beam ( ) of polarized light is directed at an angle of incidence &agr;≠0° onto a measurement location (M) on the surface of a specimen (P). Information concerning properties of the specimen (P), preferably concerning layer thicknesses and optical material properties such as refractive index n, extinction coefficient k, and the like, is obtained from an analysis of a return beam ( ) reflected from the specimen (P). The incident beam ( ) is directed by a mirror objective ( ) onto the surface of the specimen (P). The return beam ( ) is also captured by the mirror objective ( ). The result is to create an optical measurement arrangement, operating on the ellipsometric principle, which has a simple, compact configuration and permits a high measurement accuracy down to the sub-nanometer range.