Christof Stey

Title: Christof Stey: Innovator in Optical Measurement Technologies

Introduction

Christof Stey is a notable inventor based in Wetzlar, Germany. He has made significant contributions to the field of optical measurement technologies, holding 2 patents that showcase his innovative approach to microscopy and ellipsometry.

Latest Patents

One of his latest patents is a method for automatically determining the position in a sample arrangement and corresponding microscope. This method involves generating a measurement beam directed at a sample arrangement, detecting the reflected measurement beam, and determining multiple positions based on the displacement of the sample arrangement. Another significant patent is an optical measurement arrangement featuring an ellipsometer. This invention allows for the analysis of properties of a specimen, such as layer thicknesses and optical material properties, using a compact configuration that achieves high measurement accuracy down to the sub-nanometer range.

Career Highlights

Christof Stey has worked with prominent companies in the field, including Leica Microsystems Jena GmbH and Leica Microsystems CMS GmbH. His experience in these organizations has contributed to his expertise in optical technologies and measurement systems.

Collaborations

Throughout his career, Stey has collaborated with notable professionals, including Hakon Mikkelsen and Horst Engel. These collaborations have further enriched his work and innovations in the field.

Conclusion

Christof Stey is a distinguished inventor whose work in optical measurement technologies has led to significant advancements in microscopy and ellipsometry. His patents reflect a commitment to innovation and precision in scientific measurement.