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Leica Microsystems Jena Gmbh

USPTO Granted Patents = 18

Forward Citations = 171

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22 inventors (with patents filed for the assignee):

Joachim Wienecke (11 out of 18 patents)

Andreas Birkner (5 out of 12 patents)

Knut Hiltawski (5 out of 5 patents)

4. Frank Bernhardt (4 out of 4 patents)

5. Hakon Mikkelsen (4 out of 4 patents)

6. Matthias Slodowski (3 out of 6 patents)

7. Karsten Urban (3 out of 4 patents)

8. Horst Engel (3 out of 3 patents)

9. Uwe Graf (2 out of 6 patents)

10. Lambert Danner (2 out of 14 patents)

11. Michael Veith (2 out of 6 patents)

12. Kuno Backhaus (2 out of 3 patents)

13. Gert Weniger (1 out of 3 patents)

14. Thomas Iffland (1 out of 2 patents)

15. Detlef Wolter (1 out of 2 patents)

18 patents: Sort by Forward Citations

1. 7041952 - Method for automatic focusing an imaging optical system on the surface of a sample (2006-05-09),

2. 7028565 - Method and arrangement for transporting and inspecting semiconductor substrates (2006-04-18),

3. 7002740 - Setting module for the illumination of an optical instrument (2006-02-21),

4. 6985237 - Method for determining layer thickness ranges (2006-01-10),

5. 6962471 - Substrate conveying module and system made up of substrate conveying module and workstation (2005-11-08),

6. 6941009 - Method for evaluating pattern defects on a water surface (2005-09-06),

7. 6918735 - Holding device for wafers (2005-07-19),

8. 6845174 - Arrangement and method for the identification of substrates (2005-01-18),

9. 6826511 - Method and apparatus for the determination of layer thicknesses (2004-11-30),

10. 6789436 - Method and arrangement for transporting and inspecting semiconductor substrates (2004-09-14),

11. 6775583 - Method and apparatus for user guidance in optical inspection and measurement of thin films and substrates, and software therefore (2004-08-10),

12. 6713746 - Arrangement and method for illuminating a specimen field in an optical instrument (2004-03-30),

13. 6674524 - Arrangement for the visual inspection of substrates (2004-01-06),

14. 6618154 - Optical measurement arrangement, in particular for layer thickness measurement (2003-09-09),

15. 6600560 - Optical measurement arrangement having an ellipsometer (2003-07-29),

Leica Microsystems Jena GmbH is a leading provider of optical microscopy, digital imaging, and workflow solutions for the life science and industrial sectors. With a rich heritage dating back to 1869, Leica Microsystems Jena GmbH combines German engineering excellence with innovative technologies to deliver high-quality products. Our portfolio includes a wide range of microscopes, optics, cameras, software, and accessories for various research, analysis, and imaging applications. We strive to help our customers advance scientific discovery, improve productivity, and enhance patient outcomes through our cutting-edge solutions.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 9 2025

18 Patents

#21 in Jena

#2,403 in Germany

#33,147 in the World

Leica Microsystems Jena Gmbh

Forward Citations = 171

22 inventors:

Joachim Wienecke (11 out of 18 patents)

Andreas Birkner (5 out of 12 patents)

Knut Hiltawski (5 out of 5 patents)

4. Frank Bernhardt (4 out of 4 patents)

5. Hakon Mikkelsen (4 out of 4 patents)

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