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Leica Microsystems Jena Gmbh

USPTO Granted Patents = 18

% Expired Patents = 33.3

Forward Citations = 174

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22 inventors (with patents filed for the assignee):

Joachim Wienecke (11 out of 18 patents)

Andreas Birkner (5 out of 12 patents)

Knut Hiltawski (5 out of 5 patents)

4. Frank Bernhardt (4 out of 4 patents)

5. Hakon Mikkelsen (4 out of 4 patents)

6. Matthias Slodowski (3 out of 6 patents)

7. Karsten Urban (3 out of 4 patents)

8. Horst Engel (3 out of 3 patents)

9. Uwe Graf (2 out of 6 patents)

10. Lambert Danner (2 out of 14 patents)

11. Michael Veith (2 out of 6 patents)

12. Kuno Backhaus (2 out of 3 patents)

13. Gert Weniger (1 out of 3 patents)

14. Thomas Iffland (1 out of 2 patents)

15. Detlef Wolter (1 out of 2 patents)

18 patents: Sort by Forward Citations

1. 7041952 - Method for automatic focusing an imaging optical system on the surface of a sample (2006-05-09),

2. 7028565 - Method and arrangement for transporting and inspecting semiconductor substrates (2006-04-18),

3. 7002740 - Setting module for the illumination of an optical instrument (2006-02-21),

4. 6985237 - Method for determining layer thickness ranges (2006-01-10),

5. 6962471 - Substrate conveying module and system made up of substrate conveying module and workstation (2005-11-08),

6. 6941009 - Method for evaluating pattern defects on a water surface (2005-09-06),

7. 6918735 - Holding device for wafers (2005-07-19),

8. 6845174 - Arrangement and method for the identification of substrates (2005-01-18),

9. 6826511 - Method and apparatus for the determination of layer thicknesses (2004-11-30),

10. 6789436 - Method and arrangement for transporting and inspecting semiconductor substrates (2004-09-14),

11. 6775583 - Method and apparatus for user guidance in optical inspection and measurement of thin films and substrates, and software therefore (2004-08-10),

12. 6713746 - Arrangement and method for illuminating a specimen field in an optical instrument (2004-03-30),

13. 6674524 - Arrangement for the visual inspection of substrates (2004-01-06),

14. 6618154 - Optical measurement arrangement, in particular for layer thickness measurement (2003-09-09),

15. 6600560 - Optical measurement arrangement having an ellipsometer (2003-07-29),

Company Overview

Leica Microsystems Jena GmbH specializes in the development and manufacturing of advanced optical systems and microscopy solutions. The company is renowned for its innovative technologies that enhance imaging and analysis in life sciences, materials science, and industrial applications. With a strong focus on precision and quality, Leica Microsystems provides tools that support research and diagnostics, contributing significantly to scientific advancements. Based in Jena, Germany, the company plays a pivotal role in the global microscopy market.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

18 Patents

#21 in Jena

#2,391 in Germany

#34,187 in the World

Leica Microsystems Jena Gmbh

Forward Citations = 174

22 inventors:

Joachim Wienecke (11 out of 18 patents)

Andreas Birkner (5 out of 12 patents)

Knut Hiltawski (5 out of 5 patents)

4. Frank Bernhardt (4 out of 4 patents)

5. Hakon Mikkelsen (4 out of 4 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Leica Microsystems Jena Gmbh. Retrieved from https://idiyas.com/company/leica-microsystems-jena

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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