Hakon Mikkelsen

Title: Hakon Mikkelsen: Innovator in Layer Thickness Measurement

Introduction

Hakon Mikkelsen is a notable inventor based in Göttingen, Germany. He has made significant contributions to the field of optical measurement, particularly in determining layer thicknesses of various specimens. With a total of four patents to his name, Mikkelsen's work has advanced the methodologies used in optical analysis.

Latest Patents

Mikkelsen's latest patents include a "Method for determining layer thickness ranges" and a "Method and apparatus for the determination of layer thicknesses." The first patent focuses on a method that measures the reflection spectrum of a specimen within a specified wavelength range. It involves smoothing the spectrum, determining the number of extremes, and comparing these with modeled reflection spectra to ascertain layer thickness ranges. The second patent describes a method and apparatus for determining layer thicknesses and optical parameters by measuring the reflectance spectrum and adapting a modeled spectrum to the measured one through an optimization criterion.

Career Highlights

Hakon Mikkelsen is currently employed at Leica Microsystems Jena GmbH, where he continues to innovate in the field of optical measurement. His work has been instrumental in enhancing the accuracy and efficiency of layer thickness determination, which is crucial in various scientific and industrial applications.

Collaborations

Mikkelsen has collaborated with notable colleagues such as Horst Engel and Joachim Wienecke. Their combined expertise has contributed to the development of advanced measurement techniques and technologies.

Conclusion

Hakon Mikkelsen's contributions to the field of optical measurement through his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in layer thickness determination and optical analysis.