Kuno Backhaus

Title: Kuno Backhaus: Innovator in Optical Measurement Technologies

Introduction

Kuno Backhaus is a notable inventor based in Zoellnitz, Germany. He has made significant contributions to the field of optical measurement technologies, holding a total of three patents. His work primarily focuses on improving inspection methods for semiconductor manufacturing processes.

Latest Patents

One of Kuno Backhaus's latest patents is titled "Arrangement and method for inspecting unpatterned wafers." This invention involves an arrangement designed for inspecting unpatterned wafers, utilizing a first optical inspection device that examines reference wafers through image data processing methods. It recognizes defects on these reference wafers and employs a scattered-light measuring instrument calibrated with the reference wafers to identify defect locations on the wafers to be inspected. Additionally, a second optical inspection device examines only those locations where a threshold value exceedance is detected. This innovative arrangement enhances the efficiency of wafer inspection in production lines.

Another significant patent is the "Optical measurement arrangement, in particular for layer thickness measurement." This invention pertains to an optical measurement setup that ascertains optical material properties, such as refractive index and extinction factor, of a specimen. It includes an illumination device for emitting a measurement light beam, a beam splitter for dividing the light beam, and a measurement objective for directing the light onto the specimen's surface. The analysis device then processes the reflected light to provide information about the specimen, particularly regarding layer thicknesses. This compact optical measurement arrangement is designed to be flexible and insensitive to disturbances, making it suitable for automatic monitoring in semiconductor chip manufacturing.

Career Highlights

Kuno Backhaus has worked with prominent companies in the field, including Leica Microsystems Jena GmbH and Vistec Semiconductor Systems Jena GmbH. His experience in these organizations has contributed to his expertise in optical measurement technologies and semiconductor processes.

Collaborations

Throughout his career, Kuno has collaborated with notable colleagues such as Joachim Wienecke and Matthias Slodowski. These collaborations have likely enriched his work and led to advancements in the technologies he has developed.

Conclusion

Kuno Backhaus is a distinguished inventor whose contributions to optical measurement technologies have significantly impacted the semiconductor industry. His innovative patents and career achievements reflect his dedication to advancing inspection methods and measurement arrangements.